High-entropy amorphous NbTiAlSiWx
films (x = 0 or 1, i.e.
) were prepared by magnetron sputtering method in the atmosphere of a mixture of N2
+ Ar (N2
+ Ar = 24 standard cubic centimeter per minute (sccm)), where N2
= 0, 4, and 8 sccm). All the as-deposited films present amorphous structures, which remain stable at 700 °C for over 24 h. After heat treatment at 1000 °C the films began to crystalize, and while the NbTiAlSiNy
= 4, 8 sccm) exhibit a face-centered cubic (FCC) structure, the NbTiAlSiW metallic films show a body-centered cubic (BCC) structure and then transit into a FCC structure composed of nanoscaled particles with increasing nitrogen flow rate. The hardness and modulus of the as-deposited NbTiAlSiNy
films reach maximum values of 20.5 GPa and 206.8 GPa, respectively. For the as-deposited NbTiAlSiWNy
films, both modulus and hardness increased to maximum values of 13.6 GPa and 154.4 GPa, respectively, and then decrease as the N2
flow rate is increased. Both films could be potential candidates for protective coatings at high temperature.