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Journal: J. Low Power Electron. Appl., 2021
Volume: 11
Number: 2

Article: Coverage Layout Design Rules and Insertion Utilities for CMP-Related Processes
Authors: by Eitan N. Shauly and Sagee Rosenthal
Link: https://0-www-mdpi-com.brum.beds.ac.uk/2079-9268/11/1/2

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