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Editorial

Acknowledgment to Reviewers of JMMP in 2020

MDPI AG, St. Alban-Anlage 66, 4052 Basel, Switzerland
J. Manuf. Mater. Process. 2021, 5(1), 14; https://0-doi-org.brum.beds.ac.uk/10.3390/jmmp5010014
Published: 28 January 2021
Peer review is the driving force of journal development, and reviewers are gatekeepers who ensure that JMMP maintains its standards for the high quality of its published papers. Thanks to the cooperation of our reviewers, in 2020, the median time to first decision was 15 days and the median time to publication was 32 days. The editors would like to express their sincere gratitude to the following reviewers for their precious time and dedication, regardless of whether the papers were finally published:
Agiasofitou, EleniCalvo, Roque
Alaluss, KhaledCamelio, Jaime
Alar, VesnaCampos Rubio, Juan Carlos
Alcarria, RamonCantero Guisández, José Luis
Andriollo, TitoCao, Pingxiang
Antosz, KatarzynaCardon, Ludwig
Arevalo, CristinaCarou, Diego
Axinte, EugenCerchione, Roberto
Azizi, AydinCeruti, Alessandro
Bähre, DirkChang, Tai-Woo
Bai, MingwenChaudhari, Akshay
Balle, FrankChaus, Alexander S.
Barbi, SilviaChicos, Lucia-Antoneta
Barriobero-Vila, PereCho, Sunghun
Bartkowska, AnetaCicero, Sergio
Bartnicki, JarosławCinkilic, Emre
Bellantone, VincenzoCorrea, Diego Rafael Nespeque
Benardos, PanoriosCostantino, Francesco
Bengtsson, MarcusCuan-Urquizo, Enrique
Benhassine, MehdiDa Silva, Francisco José Gomes
Bernardo, Luis Filipe AlmeidaDe Freitas Daudt, Natália
Bidulská, JanaDe Lacalle, Luis N. López
Biswal, Romalide Souza, Adriano Fagali
Blaga, Lucian A.Deja, Mariusz
Blum, WolfgangDemo, Pavel
Boccarusso, LucaDhamdhere, AJIT
Bombac, DavidDiaz, Jose
Bordeenithikasem, PunnathatDiniz, Anselmo
Boroński, DariuszDixon, David A.
Borsato, MiltonDobrocky, David
Bou, Santiago FerrandizDong, Yan
Bozena, GajdzikDorado, Ruben
Brandão, Lincoln CardosoDuchosal, Arnaud
Buchmayr, BrunoDulska, Agnieszka
Buhl, JohannesDurejko, Tomasz
Calaf Chica, JoseEgan, Paul F.
Eitzinger, ChristianIto, Kazuhiro
Eliseev, AlexanderIto, Kiyohiro
Elkaseer, AhmedJackson, Mark
ElSayed, AhmedJandaghi, Mohammad Reza
Epp, JeremyJasiewicz, Marcin
Everett, RichardJerez-Mesa, Ramón
Feito, NorbertoJia, Fanghui
Feng, YixuanJin, Xie
Fernandez-Vidal, Severo RaulJin, Yifei
Fragassa, CristianoKaczmarczyk, Jarosław
França, Thiago ValleKamiński, Marcin
Francalanza, EmmanuelKamiya, Osamu
Fujii, YoshihisaKampa, Adrian
Fydrych, DariuszKarg, Michael C. H.
Galkiewicz, JaroslawKarlík, Miroslav
Galvão, IvanKarnati, Sreekar
Gao, LiangKazmer, David O.
Garašić, IvicaKechagias, John
García, MarceloKechagias, John D.
Gavrus, AdinelKellens, Karel
Ghaffar, SeyedKim, Man-Hoe
González Pérez, IsaíasKitagawa, Jiro
González, HernánKizaki, Toru
Grabowska, SandraKłonica, Mariusz
Grützmacher, PhilippKminiak, Richard
Guerrero-Vaca, GuillermoKoblischka, Michael R.
Ha, JinjinKoike, Mari
Habrat, WitoldKonda Gokuldoss, Prashanth
Hamel, William R.Konovalov, Sergey
Hassan, MahmoudKordoš, Marcel
Hassui, AmauriKowalczyk, Małgorzata
Hayakawa, TohruKozakiewicz, Anna
He, BinbinKrejcar, Ondrej
He, YihaiKu, Tae-Wan
Hee, Ay ChingKubit, Andrzej
Hegab, HussienKuczmaszewski, Jozef
Hełdak, MariaKuhn, Erik
Helen Margaret, DaviesKukla, Christian
Hertweck, BenjaminKulawik, Adam
Hidalgo, JavierKumar, Ch Sateesh
Hildebrand, JoergKunetsov, Vladimir
Holub, MichalKurfess, Thomas
Höppel, Heinz WernerKyratsis, Panagiotis
Hovanski, YuriLadani, Leila Jannesari
Hsia, Shao-YiLancaster, Robert
Hu, Yuh-ChungLee, Sang Jin
Huo, QinghuanLee, Sun-Kyu
Hwangbo, HyunwooLee, Yooneun
Ihara, YukitoshiLegutko, Stanisław
Ikram, AwaisLehotzky, David
Isanaka, Sriram PraneethLei, Shuting
Lermen, Richard ThomasNemeş, Ovidiu
Li, AnhaiNiemczewska-Wojcik, Magdalena
Li, DuoNiemczewska-Wójcik, Magdalena
Li, QingNikolova, Maria
Li, TaoOkechukwu, Okorie
Li, YangOkunkova, Anna A.
Lian, YunsongOliveira, Monica
Liedl, GerhardÖpöz, Tahsin
Lim, JiseokOtto, Andreas
Liu, ChangqingOzerov, Maxim
Liu, DabiaoPahlevani, Farshid
Liu, TianPamuković, Jelena Kilić
Liu, WeiPankowska, Malgorzata
Lontos, AntoniosPantazopoulos, George A.
Lorusso, MassimoPatel, Vivek
Lu, XiaohongPater, Zbigniew
Lunt, Alexander J.G.Patterson, Albert E.
Luo, LiangPekarcikova, Marcela
Luo, XichunPellizzeri, Tiffany
Ma, XiangPiccininni, Antonio
Manolakos, DimitriosPilipović, Ana
Mansour, GabrielPolasik, Robert
Markdahl, JohanPolitis, Denis
Markopoulos, Angelos P.Popa, Florin
Martínez López, José IsraelPradhan, Kallol
Maru, Marcia M.Pruncu, Catalin I.
Maruda, Radosław W.Racineux, Guillaume
Masato, DavideRadev, Dimitar
Mazzucato, FedericoRadonic, Vasa
McMillan, Alison J.Rahman, Muhommad Azizur
Mcnelley, Terry R.Raileanu, Silviu
Meenashisundaram, Ganesh KumarRibeiro, Carlos A. Silva
Mia, MozammelRivière-Lorphèvre, Edouard
Michalcová, AlenaRosenkranz, Andreas
Mikolajczyk, TadeuszRosso, Mario
Milichovský, FrantišekSakon, Takuo
Miller, Scott F.Salguero, Jorge
Minguella-Canela, JoaquimSalmi, Mika
Mirone, GiuseppeSalonitis, Konstantinos
Molaei, RezaSalvati, Enrico
Mroczka, KrzysztofSánchez, Antonio
Mucha, JacekSanchis, Raquel
Mukherjee, TuhinSarosi, Codruta
Müller, Julian MariusSarvestani, Hamidreza Yazdani
Mun, Sang DonSato, Ryuta
Nadolny, KrzysztofSchiopu, Ionut
Nakagawa, YukiSchönemann, Lars
Nambu, KoichiroSchoop, Julius
Nassiri, AliSeong, Woo-Jae
Nee, AndrewSeriani, Stefano
Nejman, AlicjaShaburova, Nataliya
Shala, AhmetVaitkus, Saulius
Shalaby, MohamedValerga Puerta, Ana Pilar
Shao, GuodongVan Den Boogaard, A.H.
Shih, Ching-longVazquez-Martinez, Juan M.
Shimizu, YukiVenuti, Valentina
Shishkin, AndreiVergara, Diego
Shokrani, AlborzVictor J., Rico
Sili, AndreaVidakis, Nectarios
Silva, FranciscoVivek, Anupam
Sing, Swee LeongVoloshin, Aleksandr
Skripnyak, Vladimir A.Volpp, Joerg
Slatineanu, LaurentiuVosniakos, George-Christopher
Slobodyan, MikhailVoznyak, Yuri
Ślusarczyk, BeataWachowski, Marcin
Smoleń, AndrzejWang, Baicun
Sofia, DanieleWang, Junfeng
Šoltysová, ZuzanaWang, Sibao
Somireddy, MadhukarWang, Tianhao
Sortino, MarcoWang, Xiaoqing
Speranzini, EmanuelaWenzel, Tobias
Squillace, AntoninoWie, Jeong Jae
Stachiv, IvoWinczek, Jerzy
Stanciu, Mariana DomnicaWiora, Józef
Stavropoulos, PanagiotisWojciechowski, Szymon
Stern, AdinWorrall, Stephen
Stetter, RalfWu, Mingtao
Struzikiewicz, GrzegorzXie, Haibo
Šugár, PeterYang, Shuming
Surzhenkov, AndreiYang, Zhensheng
Svaco, MarkoYang, Zhibo
Świercz, RafałYeh, Syh-Shiuh
Świerczyńska, AleksandraYeo, Zhiquan
Szczucka-Lasota, BożenaYeong, Wai Yee
Szwajka, KrzysztofYin, Fei
Tan, CaiwangYu, Haiping
Tanaka, SatoshiYu, Nan
Tarasov, Sergei YuYusenko, Kirill V.
Tavares, S.M.O.Zarrintaj, Payam
Thapliyal, VivekZawada-Tomkiewicz, Anna
Thiede, SebastianZeljkovic, Milan
Tofangchi, AlirezaZhang, Chaoqun
Tomáš, MiroslavZhang, Hao
Tournier, ChristopheZhang, Julie
Trotta, GianlucaZhang, Shenli
Trzepiecinski, TomaszZhang, Yan
Tsai, Meng-HsiuZhang, Yang
Tsai, Meng-ShiunZhang, Yijie
Tsao, Chung ChenZhou, Peng
Unglaub, JulianZhu, Lin
Urbikain, Gorka
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JMMP Editorial Office. Acknowledgment to Reviewers of JMMP in 2020. J. Manuf. Mater. Process. 2021, 5, 14. https://0-doi-org.brum.beds.ac.uk/10.3390/jmmp5010014

AMA Style

JMMP Editorial Office. Acknowledgment to Reviewers of JMMP in 2020. Journal of Manufacturing and Materials Processing. 2021; 5(1):14. https://0-doi-org.brum.beds.ac.uk/10.3390/jmmp5010014

Chicago/Turabian Style

JMMP Editorial Office. 2021. "Acknowledgment to Reviewers of JMMP in 2020" Journal of Manufacturing and Materials Processing 5, no. 1: 14. https://0-doi-org.brum.beds.ac.uk/10.3390/jmmp5010014

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