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Two-Dimensional Nanograting Fabrication by Multistep Nanoimprint Lithography and Ion Beam Etching

1
Faculty of Engineering, Kiel University, Kaiserstraße 2, 24143 Kiel, Germany
2
Department Optics for Solar Energy, Helmholtz-Zentrum Berlin, Albert-Einstein-Str. 16, 12489 Berlin, Germany
*
Author to whom correspondence should be addressed.
Academic Editor: Andres Castellanos-Gomez
Received: 1 April 2021 / Revised: 28 April 2021 / Accepted: 4 May 2021 / Published: 19 May 2021
The application of nanopatterned electrode materials is a promising method to improve the performance of thin-film optoelectronic devices such as organic light-emitting diodes (OLEDs) and organic photovoltaics. Light coupling to active layers is enhanced by employing nanopatterns specifically tailored to the device structure. A range of different nanopatterns is typically evaluated during the development process. Fabrication of each of these nanopatterns using electron-beam lithography is time- and cost-intensive, particularly for larger-scale devices, due to the serial nature of electron beam writing. Here, we present a method to generate nanopatterns of varying depth with different nanostructure designs from a single one-dimensional grating template structure with fixed grating depth. We employ multiple subsequent steps of UV nanoimprint lithography, curing, and ion beam etching to fabricate greyscale two-dimensional nanopatterns. In this work, we present variable greyscale nanopatterning of the widely used electrode material indium tin oxide. We demonstrate the fabrication of periodic pillar-like nanostructures with different period lengths and heights in the two grating directions. The patterned films can be used either for immediate device fabrication or pattern reproduction by conventional nanoimprint lithography. Pattern reproduction is particularly interesting for the large-scale, cost-efficient fabrication of flexible optoelectronic devices. View Full-Text
Keywords: nanoimprint lithography; ion beam etching; greyscale lithography; nanopattern fabrication; periodic nanogratings; indium tin oxide; nanostructured OLEDs nanoimprint lithography; ion beam etching; greyscale lithography; nanopattern fabrication; periodic nanogratings; indium tin oxide; nanostructured OLEDs
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MDPI and ACS Style

Buhl, J.; Yoo, D.; Köpke, M.; Gerken, M. Two-Dimensional Nanograting Fabrication by Multistep Nanoimprint Lithography and Ion Beam Etching. Nanomanufacturing 2021, 1, 39-48. https://0-doi-org.brum.beds.ac.uk/10.3390/nanomanufacturing1010004

AMA Style

Buhl J, Yoo D, Köpke M, Gerken M. Two-Dimensional Nanograting Fabrication by Multistep Nanoimprint Lithography and Ion Beam Etching. Nanomanufacturing. 2021; 1(1):39-48. https://0-doi-org.brum.beds.ac.uk/10.3390/nanomanufacturing1010004

Chicago/Turabian Style

Buhl, Janek, Danbi Yoo, Markus Köpke, and Martina Gerken. 2021. "Two-Dimensional Nanograting Fabrication by Multistep Nanoimprint Lithography and Ion Beam Etching" Nanomanufacturing 1, no. 1: 39-48. https://0-doi-org.brum.beds.ac.uk/10.3390/nanomanufacturing1010004

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