X-ray Technologies and Applications for Materials Structure & Properties Characterization
A special issue of Applied Sciences (ISSN 2076-3417). This special issue belongs to the section "Optics and Lasers".
Deadline for manuscript submissions: closed (20 February 2022) | Viewed by 7627
Special Issue Editors
Interests: development of new multiferroic oxide materials using the pulsed laser deposition method dedicated to ferroelectric and the ferromagnetic applications; in-situ structure characterization of oxide thin films and hetero-structures by sophisticated in-situ synchrotron X-ray scattering methods with the goal of understanding the epitaxial growth kinetics and mechanisms of multiferroic oxides layers and multilayers; exploration of the development of the surface morphology and crystalline structure quality using the grazing incidence diffraction grazing incidence small X-ray scattering GISAXS methods; simulation of X-ray optics and beamline instrumentation; full-field X-ray transmission microscopy for chemical mapping and spectroscopy imaging
Interests: X-ray scattering from epitaxial thin layers; dynamical diffraction theory of X-rays; statistical theory of scattering; processes of self-organization during epitaxial growth of semiconductors
Special Issue Information
Dear Colleagues,
Understanding the relationship between structure and properties is becoming more crucial for the development of new and advanced materials directed to application and industry.
In recent decades, there have been versatile and valuable efforts from the scientific community to optimize the synthesis, growth of different types of materials, such as epitaxial films, self-organized structures using different deposition methods, such as pulsed laser deposition (PLD), molecular beam epitaxy (MBE), sputtering, and molecular vapor phase epitaxy (MOVPE), among others.
For the achievement of good quality and well-characterized materials, X-ray technology utilized in the ex-situ and in-situ scattering and diffraction methods in term of fast detection system, high powerful synchrotron X-ray beam, highly sophisticated, automated instrumentation, X-ray simulation and modelling; has played a very important role in exploring the structure in terms of crystallinity, morphology, interface quality, microstructure and defects. All the structural features have several impacts on the resulting properties and define consequently the more suitable application field for the developed materials. The interconnection between real imaging using microscopic methods and reciprocal space imaging by means of X-ray methods characterization lead to a deep insight into material structure evaluation and understanding and how the structure could affect the properties.
For this reason, this Special Issue of the journal Applied Sciences “X-ray Technologies and Applications for Materials Structure & Properties Characterization” aims to attract novel contributions covering the wide range of techniques that have been developed for material structure characterization and studies which could demonstrate the relationship between structure and properties.
Our topics of interest include but are not limited to the following:
- X-ray characterization methods;
- In-situ X-ray diffraction and modeling of the growth kinetics;
- Ferromagnetic and ferroelectric applications of oxide films;
- Establishment of structure properties in advanced materials;
- Microscopic and scattering methods for complementary structure characterization;
- Understanding growth kinetics and mechanisms;
- Growth process optimization as key for materials structure and application;
- Modeling and simulation of X-ray diffuse scattering and grazing incidence diffraction for surface morphology characterization.
- Role of the crystal quality on tuning the materials for specific applications.
- Relationship structure-properties;
- Material synthesis optimization for dedicated ferroelectric, ferromagnetic properties;
- Influence of the growth parameter on the structure and therefore on the properties;
Dr. Sondes Bauer
Prof. Dr. Vaclav Holy
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Applied Sciences is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- X-ray Technology
- X-ray characterization methods
- growth optimization
- modelling and simulation of X-ray scattering
- ferroelectric
- ferromagnetic applications
- in-situ structure studies
