Dear Colleagues, 

Physical vapor deposition techniques play a key role in today's ever-accelerating world. First, they are very effective for preparing brand new nanostructured thin film materials with unique physical properties. Second, unlike many other thin film preparation methods, they can be easily scaled up. Last, but not least, they are environmentally friendly technologies. For the reasons mentioned above, they are widely used in the automotive industry, in electronics, for the production of renewable energy sources, for energy saving, and in the glass industry and many others.

This Special Issue of Materials aims to present the latest contributions focusing on various aspects of PVD coating, such as research into new thin film materials or their applications. Contributions explaining the phenomena related to the preparation of thin film materials using PVD techniques (discharge plasma modeling and/or diagnostics, atomic-scale computer simulations of materials, etc.) are also welcome. We believe that this collection can help to share new inspirational ideas across the PVD community.

Dr. Jiří Rezek
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• PVD technologies
• new nanostructured thin films
• magnetron sputtering
• plasma discharge modeling
• glow discharge diagnostics
• growth mechanisms of thin films
• high-power impulse magnetron sputtering
• reactive sputtering process control
• large area coating