Advances in Epitaxial (Nano)-Materials for Optoelectronics
A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Advanced Nanomaterials and Nanotechnology".
Deadline for manuscript submissions: closed (20 April 2022) | Viewed by 1538
Special Issue Editor
Special Issue Information
Dear Colleagues,
The development of innovative materials with novel optoelectronic properties and tailored functionalities is of enormous importance for the research of new applications and, thus, for further progress in the semiconductor industry. Here, epitaxial growth methods are often used for successful material development because they offer growth control on an atomic level, and the possibility to form non-equilibrium material configurations and combinations with the highest structural perfection. In recent years, there have been intense efforts and progress in the field of planar heteroepitaxy of (highly) mismatched materials or nano-epitaxy on patterned substrates.
The Special Issue titled “Advances in epitaxial (nano)-materials for optoelectronics” addresses current progress and challenges in materials research for optoelectronic application. The scope of this issue includes but is not limited to the following topics:
- Extreme heteroepitaxy (incl. heteroepitaxy of very dissimilar materials): theory and experiment
- III-V on Si integration and technology
- Van der Waals epitaxy of 2D materials and heterostructures
- Strain relaxation and defect formation mechanisms
- Interface engineering, structural configuration, and chemistry
- Novel substrate materials and smart concepts for epitaxy
- Advanced structural characterization methods (large scale analysis, nanoanalytics, in-situ methods, etc.)
Dr. Achim Trampert
Guest Editor
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- hetero-epitaxy
- semiconductors
- III-V on Si
- 2D materials
- microstructure
- interface
- defects
- optoelectronics
