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Journal: C, 2019
Volume: 5
Number: 53

Article: Recent Advances in Seeded and Seed-Layer-Free Atomic Layer Deposition of High-K Dielectrics on Graphene for Electronics
Authors: by Emanuela Schilirò, Raffaella Lo Nigro, Fabrizio Roccaforte and Filippo Giannazzo
Link: https://0-www-mdpi-com.brum.beds.ac.uk/2311-5629/5/3/53

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