Novel Ultraviolet Laser: Generation, Properties and Applications

A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Lasers, Light Sources and Sensors".

Deadline for manuscript submissions: 1 June 2024 | Viewed by 154

Special Issue Editors

Principle Scientist, Optics & Imaging Systems, Singapore Institute of Manufacturing Technology, 2 Fusionopolis Way, Singapore 138634, Singapore
Interests: UV laser; nonlinear optics; ultrafast imaging; inspection & manufacturing; high harmonic generation

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Guest Editor
College of Electronics and Information Engineering, Sichuan University, No.24 South Section 1, Yihuan Road, Chengdu 610065, China
Interests: high-field optics; high-power mid-infrared (MIR) laser; ultrafast few-cycle lasers; deep UV lasers; nonlinear optics
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School of Instrumentation and Opto-Electronic Engineering, Beihang University, No. 37 Xueyuan Road, Haidian District, Beijing 100191, China
Interests: fiber lasers; laser sustained plasma; laser spectroscopy

Special Issue Information

Dear Colleagues,

The generation of ultraviolet lasers, or laser-like coherent light sources in the ultraviolet range, often has a strong impact on both fundamental research and applied industrial applications. Ultraviolet optical sources are the only means of providing some unique optical properties, including an extremely short wavelength, a broad frequency bandwidth, high photon energy, and high levels of interaction with almost all materials. These optical properties are critical for the development of many emerging techniques, including super-resolution imaging and lithography, multi-octave and few-cycle laser pulse generation, cold ablation and heat-affected zone free machining, highly sensitive atomic emission spectroscopy and selective sterilization.

These novel techniques further promote the development of a wide range of applications in multiple disciplines, including advanced semiconductor manufacturing, femto/atto-physics and chemistry, precision biology and medicine.

The aim of this Special Issue is to encourage researchers to report their latest achievements in the generation of novel ultraviolet laser sources or the exploration of new properties and the potential applications of these novel ultraviolet lasers. The scope of this Special Issue includes, but is not limited to, the following topics:

  • Fourth to sixth harmonic generation for UV laser generation;
  • UV laser-based micro and nanofabrication;
  • Super resolution imaging and tomography using UV laser;
  • Application of Ultraviolet Laser Working in Cold Ablation;
  • Heat-affected zone minimization; 
  • Nano particle and graphene synthesis using UV laser;
  • Nano-resolution additive manufacturing using UV polymerization;
  • DUV disinfection and sterilization;
  • UV spectroscopies for material characterization;
  • UV breakdown spectroscopy for environmental monitoring;

Dr. Hao Li
Prof. Dr. Houkun Liang
Dr. Xia Yu
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • UV laser generation
  • fourth and fifth harmonic generation
  • sum frequency generation for UV laser
  • supercontinuum and few-cycle laser pulse generation reach to UV range
  • UV lithography
  • UV imaging and tomography
  • UV precision machining
  • UV nano-microfabrication
  • UV synthesis of particle
  • UV polymerization
  • DUV disinfection and sterilization
  • UV photoelectron spectroscopy
  • UV breakdown spectroscopy

Published Papers

This special issue is now open for submission.
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