Recent Progress and Challenges Regarding Carbon Nanotube On-Chip Interconnects
Abstract
:1. Introduction
2. On-Chip Interconnect
2.1. Local Interconnect
2.2. Intermediate Interconnect
2.3. Global Interconnect
3. Through-Silicon-Via (TSV)
3.1. Carbon Nanotube
3.2. Cu-CNT Composite
4. Discussion and Perspectives
5. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Conflicts of Interest
References
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Technology Node | Material | Advantage | Limitation | Industry |
---|---|---|---|---|
14 nm | Cu/W [8,9] | Lower resistivity | Barrier effect | Intel |
10/7 nm | Co [5,10] | Barrierless Thin liner | High resistivity | Intel/Global Foundries |
5/3 nm | Ru [5,10,11,12] | Barrierless Thin liner | Surface scattering | IMEC |
<3 nm | GNR, CNT [13,14,15] | Ballistic transport | Integration/Contact resistance | TSMC |
SWCNT | MWCNT | Cu-CNT | Cu | Co | Ru | |
---|---|---|---|---|---|---|
Conductivity (S/cm) | 7 × 105 [83,84] | 2.7 × 105 [84] | 2.3–4.7 × 105 [29,85] | 5.8 × 105 | 1.6 × 105 | 1.4 × 105 |
Thermal Conductivity @300k (W/mK) | >3500 [52] | 3000 [81] | 637 [86] | 385 | 100 | 117 |
Electron mean free path @300K (nm) | >1 μm [87] | >30 μm [88] | NA | 39 | 19 [3] | 6.7 [3] |
Dielectric constant k * | graphene oxide-polyimide (k = 2) [89] | graphene oxide-polyimide (k = 2) [89] | NA | SiCOH (k = 2.4~2.55) [58] | SiCOH (k = 2.7~3.2) [58] | SiCOH (k = 2.4) [11] |
Local | Intermediate | Global | TSV | |
---|---|---|---|---|
Performance | Inferior to Cu (non-ideal) | ~30% lower delay | >30% lower delay 8 times less power consumption 7 times larger thermal conductivity | Inferior to Cu (non-ideal) |
Exceeds Cu (ideal) | Exceeds Cu at high frequency (ideal) | |||
Better thermal performance | ||||
Reliability | Exceeds Cu | Exceeds Cu | Exceeds Cu | Exceeds Cu |
Process requirements | Defectless CNTs [50], Low variability [53], Low contact resistance [53], Low temperature (Si process compatible) [36] | Defectless CNTs [50], Dense bundle, High purity [50,51], High metallic fraction [22], Low temperature (Si process compatible) [51] | Dense bundle [39], Large electron MFP [39], High metallic fraction [22], Low temperature (Si process compatible) [117] | Dense bundle [118], Large electron MFP, High metallic fraction [32], Cu-CNT composite [28], Low temperature (Si process compatible) [37] |
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Xu, B.; Chen, R.; Zhou, J.; Liang, J. Recent Progress and Challenges Regarding Carbon Nanotube On-Chip Interconnects. Micromachines 2022, 13, 1148. https://0-doi-org.brum.beds.ac.uk/10.3390/mi13071148
Xu B, Chen R, Zhou J, Liang J. Recent Progress and Challenges Regarding Carbon Nanotube On-Chip Interconnects. Micromachines. 2022; 13(7):1148. https://0-doi-org.brum.beds.ac.uk/10.3390/mi13071148
Chicago/Turabian StyleXu, Baohui, Rongmei Chen, Jiuren Zhou, and Jie Liang. 2022. "Recent Progress and Challenges Regarding Carbon Nanotube On-Chip Interconnects" Micromachines 13, no. 7: 1148. https://0-doi-org.brum.beds.ac.uk/10.3390/mi13071148