Atomic Layer Materials and Processes

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D:Materials and Processing".

Deadline for manuscript submissions: closed (31 May 2023) | Viewed by 2545

Special Issue Editors


E-Mail Website
Guest Editor
Kavli Institute of Nanoscience, California Institute of Technology, Pasadena, CA 91109, USA
Interests: atomic layer etching; interconnects and packaging; graphene synthesis and electronics; chemical vapor deposition; quantum devices
Special Issues, Collections and Topics in MDPI journals

E-Mail Website
Guest Editor
Department of Chemistry and Chemical Biology, Harvard University, Cambridge, MA 02138, USA
Interests: thermal transport; ultrafast laser spectroscopy; phonon and electron transport in nanostructures

E-Mail Website
Guest Editor
School of Integrated Circuits, Peking University, Beijing 100871, China
Interests: micro/nanofabrication; microsystem; thermal management
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

As device features become ever smaller, materials and fabrication with atomic precision are particularly of interest in the research community. Atomic layer materials such as graphene have demonstrated extraordinary electrical and optical properties for novel devices. Recent advances in the synthesis and processing of unconventional atomic layers, such as MXenes and 2D metal-organic frameworks (MOFs), offer exciting opportunities for next-generation circuits and systems. Equally exciting, disruptive advances in atomic layer deposition (ALD) and atomic layer etching (ALE) continue to provide new abilities for the additive and subtractive fabrication of 3D structures. For instance, isotropic thermal ALE shows advantages in building concave features and minimizing atomic defects in advanced IC circuits, micro-robotics, and micro electromechanical systems (MEMS). Atomic layer materials and processes are the key enabling technologies to engineer structures, functions, and properties in nanostructures, and to integrate atomic layers in industrial manufacturing.

Accordingly, this Special Issue seeks to showcase research papers and review articles that focus on novel advances in atomic layer materials/processes and their applications in electrical/optical devices, quantum circuits, MEMS, and robotics. We look forward to receiving your submissions!

Dr. Haozhe Wang
Dr. Qichen Song
Prof. Dr. Wei Wang
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • atomic layer materials
  • atomic layer etching
  • atomic layer deposition
  • characterization of atomic structures
  • quantum circuits
  • MEMS
  • micro-robotics

Published Papers (1 paper)

Order results
Result details
Select all
Export citation of selected articles as:

Research

14 pages, 3313 KiB  
Article
Optical Characterization of ALD-Coated Nanoporous Alumina Structures: Effect of Sample Geometry or Coated Layer Material
by Ana Laura Cuevas, Víctor Vega, Antonia Domínguez, Ana Silvia González, Víctor M. Prida and Juana Benavente
Micromachines 2023, 14(4), 839; https://0-doi-org.brum.beds.ac.uk/10.3390/mi14040839 - 12 Apr 2023
Cited by 2 | Viewed by 2064
Abstract
Optical characterization of nanoporous alumina-based structures (NPA-bSs), obtained by ALD deposition of a thin conformal SiO2 layer on two alumina nanosupports with different geometrical parameters (pore size and interpore distance), was performed by two noninvasive and nondestructive techniques such as spectroscopic ellipsometry [...] Read more.
Optical characterization of nanoporous alumina-based structures (NPA-bSs), obtained by ALD deposition of a thin conformal SiO2 layer on two alumina nanosupports with different geometrical parameters (pore size and interpore distance), was performed by two noninvasive and nondestructive techniques such as spectroscopic ellipsometry (SE) and photoluminescence (Ph) spectra. SE measurements allow us to estimate the refraction index and extinction coefficient for the studied samples and their dependence with wavelength for the 250–1700 nm interval, showing the effect of sample geometry and cover-layer material (SiO2, TiO2, or Fe2O3), which significantly affect the oscillatory character of both parameters, as well as changes associated with the light incidence angle, which are attributed to surface impurities and inhomogeneity. Photoluminescence curves exhibit a similar shape independently of sample pore-size/porosity, but they seem to affect intensity values. This analysis shows the potential application of these NPA-bSs platforms to nanophotonics, optical sensing, or biosensing. Full article
(This article belongs to the Special Issue Atomic Layer Materials and Processes)
Show Figures

Figure 1

Back to TopTop