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Journal: Entropy, 2020
Volume: 22
Number: 295

Article: Path Planning of Pattern Transfer Based on Dual-Operator and a Dual-Population Ant Colony Algorithm for Digital Mask Projection Lithography
Authors: by Yingzhi Wang, Tailin Han, Xu Jiang, Yuhan Yan and Hong Liu
Link: https://0-www-mdpi-com.brum.beds.ac.uk/1099-4300/22/3/295

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