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Novel Materials by Chemistry-Enabled Morphological and Structural Design

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Materials Chemistry".

Deadline for manuscript submissions: closed (20 June 2023) | Viewed by 1470

Special Issue Editors


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Guest Editor
Institute of Solid State Chemistry and Mechanochemistry, Siberian Branch of the Russian Academy of Sciences, 630128 Novosibirsk, Russia
Interests: solid state reaction; thermal decomposition reaction; microstructure; mechanical properties

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Guest Editor
Lavrentyev Institute of Hydrodynamics, Siberian Branch of the Russian Academy of Sciences, Lavrentyev Ave. 15, 630090 Novosibirsk, Russia
Interests: powder metallurgy; field-assisted sintering; metal matrix composites; powder processing; thermal spraying
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Special Issue Information

Dear Colleagues,

It is our pleasure to announce a new Special Issue of Materials entitled, “Novel Materials by Chemistry-Enabled Morphological and Structural Design”.

Recent progress in the methods of material processing has made it possible to synthesize structures with a precisely controlled elemental/phase composition and microstructure. In material design, two approaches are viable: (1) fully benefiting from the generation of a non-equilibrium structure in a material or (2) allowing the system to move from the non-equilibrium state towards equilibrium via certain steps, which can be “frozen” in a material. Solid-state reactions occurring in a system, when carried out under certain conditions, can lead to the formation of unique structures (in terms of particle shape, lattice orientation at the interface and mutual distribution of components), which is unachievable by adding together (mixing) the components. This Special Issue aims to cover materials in which particle/inclusion morphology plays a key role in determining the materials’ mechanical or functional properties. Factors responsible for the formation of particles of specific morphologies are of great interest. Research articles, reviews, communications and viewpoint papers describing the tools of chemistry-enabled material design and its promising technological outcomes are welcome.

The topics of the anticipated contributions include, but are not limited to:

  • Solid-state reactions to produce particles of specific morphologies;
  • Morphological design of particulate materials at micro/nano-levels;
  • In situ synthesis of particles in inert and chemically reactive matrices;
  • Synthesis of core–shell particles, their reactivity and sintering behavior;
  • Porous materials with tailored size and morphology;
  • Composite materials and coatings with composition and microstructure tailored at micro/nano-levels;
  • Mechanical and functional properties of materials obtained via chemistry-enabled structural design;
  • Applications of materials obtained via chemistry-enabled structural design.

We look forward to receiving your contributions.

Dr. Alexander A. Matvienko
Dr. Dina V. Dudina
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • solid-state reaction
  • particle morphology
  • core-shell particle
  • interface
  • composite materials
  • microstructure
  • matrix
  • in situ synthesis

Published Papers (1 paper)

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Research

23 pages, 7906 KiB  
Article
Enhanced Wettability, Hardness, and Tunable Optical Properties of SiCxNy Coatings Formed by Reactive Magnetron Sputtering
by Veronica S. Sulyaeva, Alexey N. Kolodin, Maxim N. Khomyakov, Alexander K. Kozhevnikov and Marina L. Kosinova
Materials 2023, 16(4), 1467; https://0-doi-org.brum.beds.ac.uk/10.3390/ma16041467 - 09 Feb 2023
Cited by 1 | Viewed by 1114
Abstract
Silicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through the reactive magnetron sputtering of a SiC target in an argon-nitrogen mixture. The deposition was carried out at room temperature and 300 °C and at an RF target [...] Read more.
Silicon carbonitride films were deposited on Si (100), Ge (111), and fused silica substrates through the reactive magnetron sputtering of a SiC target in an argon-nitrogen mixture. The deposition was carried out at room temperature and 300 °C and at an RF target power of 50–150 W. An increase in the nitrogen flow rate leads to the formation of bonds between silicon and carbon atoms and nitrogen atoms and to the formation of SiCxNy layers. The as-deposited films were analyzed with respect to their element composition, state of chemical bonding, mechanical and optical properties, and wetting behavior. It was found that all synthesized films were amorphous and represented a mixture of SiCxNy with free carbon. The films’ surfaces were smooth and uniform, with a roughness of about 0.2 nm. Depending on the deposition conditions, SiCxNy films within the composition range 24.1 < Si < 44.0 at.%, 22.4 < C < 56.1 at.%, and 1.6 < N < 51.9 at.% were prepared. The contact angle values vary from 37° to 67°, the hardness values range from 16.2 to 34.4 GPa, and the optical band gap energy changes from 1.81 to 2.53 eV depending on the synthesis conditions of the SiCxNy layers. Particular attention was paid to the study of the stability of the elemental composition of the samples over time, which showed the invariance of the composition of the SiCxNy films for five months. Full article
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